Regular Fabrics in Deep Sub-Micron Integrated-Circuit Design O.P 3Selbständigkeit und regionale Orientierung5

3Selbständigkeit und regionale Orientierung5

An introduction to the symposium was provided by two invited papers from C

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state-of-art data mining and knowledge discovery in multimedia database systems

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Regular Fabrics in Deep Sub-Micron Integrated-Circuit Design O.P 3Selbständigkeit und regionale Orientierung5Regular Fabrics in Deep Sub Micron Integrated Circuit Design discusses new approaches to better timing closure and manufacturability of DSM Integrated Circuits. The key idea presented is the use of regular circuit and interconnect structures such that area delay can be predicted with high accuracy. The co design of structures and algorithms allows great opportunities for achieving better final results, thus closing the gap between IC and CAD